Surface Science
 

Surface Science  

The ISC has a number of state-of-the-art ultrahigh vacuum systems that encompass multiple techniques for the structural and chemical analysis of nanoscale materials in situ and under operando conditions.
A more detailed description of the different systems can be found below.

UHV System 1

Room P 0.15-8 / Moke
  • Load lock
    • Transfer to electrochemical cell and UHV
  • Preparation chamber
    • Ar sputtering
    • Electron beam heater
    • Electron beam evaporator
    • Quartz crystall microbalance
    • Ion / atom hybrid plasma source
  • Analysis chamber
  • Microscopy chamber
    • HT-STM, temperature: LN2 - 1300 K
  • Electrochemical flow cell

UHV System 2

Room N 2.01 / SPECS / Orlando
  • Load lock
    • Transfer to UHV
  • Preparation chamber
    • Ar sputtering
    • Electron beam heater
    • Electron beam evaporator
    • Quartz crystall microbalance
    • Ion / atom hybrid plasma source
  • Analysis chamber
  • Microscopy chamber
    • NAP-STM/AFM (100 mbar; LN2 - 750 K)
  • High pressure reactor cell
    • Up to 20 bar
    • Interfaced to a mass spectrometer
    • Batch and flow modes

UHV System 3

The NAP-XPS system allows the preparation of samples in situ through physical vapor deposition and to expose them to different chemical environments to mimic real catalytic systems.

Room N 1.03 / SPECS / NAP-XPS
  • Load lock
  • Preparation chamber
    • Ar sputtering
    • Electron beam evaporator
    • Electron beam heater under UHV conditions, IR heater for ambient pressures up to 100 mbar, heating up to 900 K
    • Ion / atom hybrid plasma source
  • Analysis chamber
    • NAP-XPS
    • Al Kα X-ray source, with Specs FOCUS 600 ellipsoidal monochromator
    • Flood gun for charge compensations
    • Mass flow controllers for gases dosing
    • Base pressure: 1 × 10-10 mbar
  • IR / TPD chamber
    • Infrared Reflective-Absorption spectrometer (IRRAS) for in situ surface film characterization
    • Quadrupole mass spectrometer
    • TPD
    • Electron beam heater
  • High pressure reactor cell
    • Up to 20 bar
    • IR heating up to 1100 K

UHV System 4

Room P 0.15-3 / SPECS / Bochum NAP-SPM
  • Load lock
  • Preparation chamber
    • Ar sputtering
    • Electron beam evaporators
    • Electron beam heater
    • Ion / atom hybrid plasma source
  • Analysis chamber
  • High pressure reactor cell
    • Up to 20 bar
    • Mass spectrometer
  • Electrochemical cell and UHV transfer buffer chamber

UHV System 5

Room D. K 0.05 / FEL
  • Sample entry load lock
  • Two Chamber system for Surface Action Spectroscopy (SAS)
    • 'Messenger' atom (e.g. He, Ne, H2) detection: quadrupole mass spectrometer (MS)
  • FHI Free Electron Laser (FEL) generating infrared (IR) radiation for surface vibration excitation
  • Helium flow cryostat-cooled manipulator
  • STM/AFM system (12 K  - 300 K)
  • Ar Sputter gun, electron beam evaporator
  • LEED
  • Microwave plasma source

UHV System 6

Room N 0.05 /  STM-XPS TDS
  • Load lock
  • Analysis chamber
    • Ar sputter gun
    • Electron beam evaporator
    • Quartz crystal microbalance
    • XPS
    • STM, room temperature
    • TPD
    • LEED-IV
  • Electrochemical cell connected to UHV

UHV System 7

Room P 0.15-6 / HREELS
  • Load lock
  • Preparation chamber
    • Ar sputter gun
    • Electron beam evaporation
    • LEED
    • AES
    • Quadrupole mass spectrometer
  • Analyis chamber for thin-film catalysis investigations

UHV System 8

Room N 2.02 / PM-IRAS
  • Preparation / analysis chamber
    • Ar sputtering
    • Resistive heating (LN2 – 1200 K)
    • 2 Electron beam evaporators
    • Quadrupole mass spectrometer
    • Ion / atom hybrid plasma source
    • LEED
    • TPD
    • XPS
  • High pressure reaction chamber (UHV up to 1 bar)
    • IRAS
    • Polarization modulated IRAS (PM-IRAS)
    • Gas chromatograph

UHV System 9

Room P 0.15-5
  • Preparation / analysis chamber
    • Ar sputtering
    • Resistive heating (LN2 – 1200 K)
    • Electron beam evaporator
    • Quadrupole mass spectrometer
    • LEED
    • TPD
    • IRAS
  • High pressure reaction chamber (UHV up to 1 bar)
    • Gas chromatograph
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