![Surface Science
Surface Science](/426151/header_image-1593453122.jpg?t=eyJ3aWR0aCI6ODQ4LCJmaWxlX2V4dGVuc2lvbiI6ImpwZyIsIm9ial9pZCI6NDI2MTUxfQ%3D%3D--0eaab73f642cbe962d86d230388dfd2adf030bdf)
Surface Science
The ISC has a number of state-of-the-art ultrahigh vacuum systems that encompass multiple techniques for the structural and chemical analysis of nanoscale materials in situ and under operando conditions.
A more detailed description of the different systems can be found below.
UHV System 1
![Room P 0.15-8 / Moke](/368838/original-1595927982.jpg?t=eyJ3aWR0aCI6MjQ2LCJvYmpfaWQiOjM2ODgzOH0%3D--be39b35f959a02a3cf0ff61b36ae1b645018b7c5)
Room P 0.15-8 / Moke
- Load lock
- Transfer to electrochemical cell and UHV
- Preparation chamber
- Ar sputtering
- Electron beam heater
- Electron beam evaporator
- Quartz crystall microbalance
- Ion / atom hybrid plasma source
- Analysis chamber
- Microscopy chamber
- HT-STM, temperature: LN2 - 1300 K
- Electrochemical flow cell
UHV System 2
![Room N 2.01 / SPECS / Orlando](/449006/original-1596710562.jpg?t=eyJ3aWR0aCI6MjQ2LCJvYmpfaWQiOjQ0OTAwNn0%3D--89e0f34e4c6ab98ed77ce8ac0b616961c22ef014)
Room N 2.01 / SPECS / Orlando
- Load lock
- Transfer to UHV
- Preparation chamber
- Ar sputtering
- Electron beam heater
- Electron beam evaporator
- Quartz crystall microbalance
- Ion / atom hybrid plasma source
- Analysis chamber
- Microscopy chamber
- NAP-STM/AFM (100 mbar; LN2 - 750 K)
- High pressure reactor cell
- Up to 20 bar
- Interfaced to a mass spectrometer
- Batch and flow modes
UHV System 3
The NAP-XPS system allows the preparation of samples in situ through physical vapor deposition and to expose them to different chemical environments to mimic real catalytic systems.
![Room N 1.03 / SPECS / NAP-XPS](/449242/original-1596710562.jpg?t=eyJ3aWR0aCI6MjQ2LCJvYmpfaWQiOjQ0OTI0Mn0%3D--acbed9c6440efef592309ae0f7b515ddb26c1cfc)
Room N 1.03 / SPECS / NAP-XPS
- Load lock
- Preparation chamber
- Ar sputtering
- Electron beam evaporator
- Electron beam heater under UHV conditions, IR heater for ambient pressures up to 100 mbar, heating up to 900 K
- Ion / atom hybrid plasma source
- Analysis chamber
- NAP-XPS
- Al Kα X-ray source, with Specs FOCUS 600 ellipsoidal monochromator
- Flood gun for charge compensations
- Mass flow controllers for gases dosing
- Base pressure: 1 × 10-10 mbar
- IR / TPD chamber
- Infrared Reflective-Absorption spectrometer (IRRAS) for in situ surface film characterization
- Quadrupole mass spectrometer
- TPD
- Electron beam heater
- High pressure reactor cell
- Up to 20 bar
- IR heating up to 1100 K
UHV System 4
![Room P 0.15-3 / SPECS / Bochum NAP-SPM](/426781/original-1596710562.jpg?t=eyJ3aWR0aCI6MjQ2LCJvYmpfaWQiOjQyNjc4MX0%3D--ebcf49400c1c22a941b4c02bd60403fc08e95758)
Room P 0.15-3 / SPECS / Bochum NAP-SPM
- Load lock
- Preparation chamber
- Ar sputtering
- Electron beam evaporators
- Electron beam heater
- Ion / atom hybrid plasma source
- Analysis chamber
- High pressure reactor cell
- Up to 20 bar
- Mass spectrometer
- Electrochemical cell and UHV transfer buffer chamber
UHV System 5
![Room D. K 0.05 / FEL](/426437/original-1596118766.jpg?t=eyJ3aWR0aCI6MjQ2LCJvYmpfaWQiOjQyNjQzN30%3D--65a42388e8b8e90a0ec32cef35b40983f6004922)
Room D. K 0.05 / FEL
- Sample entry load lock
- Two Chamber system for Surface Action Spectroscopy (SAS)
- 'Messenger' atom (e.g. He, Ne, H2) detection: quadrupole mass spectrometer (MS)
- FHI Free Electron Laser (FEL) generating infrared (IR) radiation for surface vibration excitation
- Helium flow cryostat-cooled manipulator
- STM/AFM system (12 K - 300 K)
- Ar Sputter gun, electron beam evaporator
- LEED
- Microwave plasma source
UHV System 6
![Room N 0.05 / STM-XPS TDS](/424541/original-1596112913.jpg?t=eyJ3aWR0aCI6MjQ2LCJvYmpfaWQiOjQyNDU0MX0%3D--a46bf3686096525027bd85395a4ec8772db16b6c)
Room N 0.05 / STM-XPS TDS
- Load lock
- Analysis chamber
- Ar sputter gun
- Electron beam evaporator
- Quartz crystal microbalance
- XPS
- STM, room temperature
- TPD
- LEED-IV
- Electrochemical cell connected to UHV
UHV System 7
![Room P 0.15-6 / HREELS](/426516/original-1596118829.jpg?t=eyJ3aWR0aCI6MjQ2LCJvYmpfaWQiOjQyNjUxNn0%3D--bcf30b254b022401d6ed70fb8e4d3cc6716a572c)
Room P 0.15-6 / HREELS
- Load lock
- Preparation chamber
- Ar sputter gun
- Electron beam evaporation
- LEED
- AES
- Quadrupole mass spectrometer
- Analyis chamber for thin-film catalysis investigations
UHV System 8
![Room N 2.02 / PM-IRAS](/461631/original-1596812001.jpg?t=eyJ3aWR0aCI6MjQ2LCJvYmpfaWQiOjQ2MTYzMX0%3D--eb4c0798ce5768df6716bb038729a9c635395aa0)
Room N 2.02 / PM-IRAS
- Preparation / analysis chamber
- Ar sputtering
- Resistive heating (LN2 – 1200 K)
- 2 Electron beam evaporators
- Quadrupole mass spectrometer
- Ion / atom hybrid plasma source
- LEED
- TPD
- XPS
- High pressure reaction chamber (UHV up to 1 bar)
- IRAS
- Polarization modulated IRAS (PM-IRAS)
- Gas chromatograph
UHV System 9
![Room P 0.15-5](/462280/original-1596812853.jpg?t=eyJ3aWR0aCI6MjQ2LCJvYmpfaWQiOjQ2MjI4MH0%3D--0f3584a56847bdd6ac504e4178215125ce37b3c7)
Room P 0.15-5
- Preparation / analysis chamber
- Ar sputtering
- Resistive heating (LN2 – 1200 K)
- Electron beam evaporator
- Quadrupole mass spectrometer
- LEED
- TPD
- IRAS
- High pressure reaction chamber (UHV up to 1 bar)
- Gas chromatograph