Working Paper
Belova, V., H. Gao, W. Sghaier, A. Manikas, M. Saedi, H. Heenen, C. Galiotis, G. Renaud, O.V. Konovalov, I.M.N. Groot, K. Reuter and M. Jankowski: Operando Characterization and Molecular Simulations Reveal the Growth Kinetics of Graphene on Liquid Copper during Chemical Vapor Deposition., in press.