Publikationen von Thomas Schroeder

Magg, N.; Immaraporn, B.; Giorgi, J. B.; Schroeder, T.; Bäumer, M.; Döbler, J.; Wu, Z.; Kondratenko, E.; Cherian, M.; Baerns, M. et al.; Stair, P. C.; Sauer, J.; Freund, H.-J.: Vibrational spectra of alumina- and silica-supported vanadia revisited: An experimental and theoretical model catalyst study. Journal of Catalysis 226 (1), S. 88 - 100 (2004)

Magg, N.; Giorgi, J. B.; Frank, M. M.; Immaraporn, B.; Schroeder, T.; Bäumer, M.; Freund, H.-J.: Alumina-supported vanadium nanoparticles: structural characterization and CO adsorption properties. Journal of the American Chemical Society 126 (11), S. 3616 - 3626 (2004)

Magg, N.; Giorgi, J. B.; Hammoudeh, A.; Schroeder, T.; Bäumer, M.; Freund, H.-J.: Model catalyst studies on vanadia particles deposited onto a thin-film alumina support. 2. Interaction with carbon monoxide. The Journal of Physical Chemistry B 107 (34), S. 9003 - 9010 (2003)

Schroeder, T.; Giorgi, J. B.; Bäumer, M.; Freund, H.-J.: Morphological and electronic properties of ultrathin crystalline silica epilayers on a Mo(112) substrate. Physical Review B 66 (16), S. 165422-1 - 165422-11 (2002)

Magg, N.; Giorgi, J. B.; Schroeder, T.; Bäumer, M.; Freund, H.-J.: Model catalyst studies on vanadia particles deposited onto a thin-film alumina support. 1. Structural characterization. Journal of Physical Chemistry B 106 (34), S. 8756 - 8761 (2002)

Schroeder, T.; Giorgi, J. B.; Hammoudeh, A.; Magg, N.; Bäumer, M.; Freund, H.-J.: Oxygen-induced p(2x3) reconstruction on Mo(112) studied by LEED and STM. Physical Review B 65 (11), 115411 (2002)

Giorgi, J. B.; Schroeder, T.; Bäumer, M.; Freund, H.-J.: Study of CO adsorption on crystalline-silica-supported palladium particles. Surface science 498 (1-2), S. L71 - L77 (2002)

Schroeder, T.; Hammoudeh, A.; Pykavy, M.; Magg, N.; Adelt, M.; Bäumer, M.; Freund, H.-J.: Single crystalline silicon dioxide films on Mo(1 1 2). Solid-State Electronics 45 (8), S. 1471 - 1478 (2001)

Schroeder, T.; Adelt, M.; Richter, B.; Naschitzki, M.; Bäumer, M.; Freund, H.-J.: Growth of well-ordered silicon dioxide films on Mo(112). Microelectronics Reliability 40 (4-5), S. 841 - 844 (2000)

Schroeder, T.; Adelt, M.; Richter, B.; Naschitzki, M.; Bäumer, M.; Freund, H.-J.: Epitaxial growth of SiO₂ on Mo(112). Surface Review and Letters 7 (1-2), S. 7 - 14 (2000)

Schröder, T.: Preparation and properties of ultrathin crystalline silica layers on a Mo(112) substrate surface - the birth of a new model oxide support. Dissertation, Humboldt-Universität, Berlin (2001)