Publikationen von Thomas Schroeder

Magg, N., J.B. Giorgi, M.M. Frank, B. Immaraporn, T. Schroeder, M. Bäumer und H.-J. Freund: Alumina-supported vanadium nanoparticles: structural characterization and CO adsorption properties. Journal of the American Chemical Society 126 (11), 3616–3626 (2004).

Magg, N., B. Immaraporn, J.B. Giorgi, T. Schroeder, M. Bäumer, J. Döbler, Z. Wu, E. Kondratenko, M. Cherian, M. Baerns, P.C. Stair, J. Sauer und H.-J. Freund: Vibrational spectra of alumina- and silica-supported vanadia revisited: An experimental and theoretical model catalyst study. Journal of Catalysis 226 (1), 88–100 (2004).

Magg, N., J.B. Giorgi, A. Hammoudeh, T. Schroeder, M. Bäumer und H.-J. Freund: Model catalyst studies on vanadia particles deposited onto a thin-film alumina support. 2. Interaction with carbon monoxide. The Journal of Physical Chemistry B 107 (34), 9003–9010 (2003).

Giorgi, J.B., T. Schroeder, M. Bäumer und H.-J. Freund: Study of CO adsorption on crystalline-silica-supported palladium particles. Surface science 498 (1-2), L71–L77 (2002).

Magg, N., J.B. Giorgi, T. Schroeder, M. Bäumer und H.-J. Freund: Model catalyst studies on vanadia particles deposited onto a thin-film alumina support. 1. Structural characterization. Journal of Physical Chemistry B 106 (34), 8756–8761 (2002).

Schroeder, T., J.B. Giorgi, M. Bäumer und H.-J. Freund: Morphological and electronic properties of ultrathin crystalline silica epilayers on a Mo(112) substrate. Physical Review B 66 (16), 165422–1-165422–11 (2002).

Schroeder, T., J.B. Giorgi, A. Hammoudeh, N. Magg, M. Bäumer und H.-J. Freund: Oxygen-induced p(2x3) reconstruction on Mo(112) studied by LEED and STM. Physical Review B 65 (11), 115411 (2002).

Schroeder, T., A. Hammoudeh, M. Pykavy, N. Magg, M. Adelt, M. Bäumer und H.-J. Freund: Single crystalline silicon dioxide films on Mo(1 1 2). Solid-State Electronics 45 (8), 1471–1478 (2001).

Schroeder, T., M. Adelt, B. Richter, M. Naschitzki, M. Bäumer und H.-J. Freund: Growth of well-ordered silicon dioxide films on Mo(112). Microelectronics Reliability 40 (4-5), 841–844 (2000).

Schroeder, T., M. Adelt, B. Richter, M. Naschitzki, M. Bäumer und H.-J. Freund: Epitaxial growth of SiO₂ on Mo(112). Surface Review and Letters 7 (1-2), 7–14 (2000).

Schröder, T.: Preparation and properties of ultrathin crystalline silica layers on a Mo(112) substrate surface - the birth of a new model oxide support. Humboldt-Universität Berlin