BESSY-II Instruments

BESSY-II Instruments

Instruments located at synchrotron light source BESSY II of the Helmholtz Centre Berlin for Materials and Energy (HZB). The instruments are operated by the group of Dr. Thomas Schmidt.

SMART located at the UE49PGM beamline at BESSY-II (left) and LEEM-III (right) instrument at BESSY-II

SMART

  • Low Energy and Photo-Emission Electron Microscope (LEEM and PEEM)
  • Equipped with aberration corrector and energy filter
  • Lateral Resolution
    • LEEM: 2.6 nm
    • XPEEM: 18 nm (energy filter, using X-rays)
    • PEEM: 10 nm (Hg short arc lamp)
  • A variety of methods available for comprehensive characterization of complex surfaces
    • Microscopy: XPEEM, NEXAFS-PEEM, LEEM
    • Spectroscopy: NEXAFS, XPS, UPS, XMCD, XMLD
    • k-space: LEED, photoelectron diffraction (PED), valence band structure mapping
  • Surface sensitivity between 0.5 nm and 2 nm
  • In situ observation of surface reactions
  • Quasi-in situ electrochemistry experiments
  • Material deposition at the measurement position
  • Sample cooling and annealing
  • Base pressure: 1 × 10-10 mbar

Elmitec LEEM

  • Low Energy and Photo-Emission Electron Microscope (LEEM and PEEM)
  • Lateral Resolution
    • LEEM: 8 nm
    • PEEM: 12 nm (Hg short arc lamp)
  • Capabilities
    • Bright and Dark Field LEEM, Mirror Electron Microscopy (MEM), Hg-PEEM, and Low Energy Electron Diffraction (LEED)
    • Surface sensitivity between 0.5 nm and 2 nm
    • Fast direct imaging
    • In situ observation of surface reaction with reactive gases
    • Material deposition at the measurement position
    • Sample cooling and annealing
    • Base pressure: 1 × 10-10 mbar
Go to Editor View