BEGIN:VCALENDAR
VERSION:2.0
PRODID:icalendar-ruby
CALSCALE:GREGORIAN
METHOD:PUBLISH
BEGIN:VEVENT
DTSTAMP:20260524T145528Z
UID:https://www.fhi.mpg.de/events/42870/60031
DTSTART:20250918T073000Z
DTEND:20250918T083000Z
CLASS:PUBLIC
CREATED:20250903T061321Z
DESCRIPTION:Change notice: Special MP Department Seminar\nTRUMPF and ASML d
 eveloped a technology to produce extreme ultraviolet (EUV) light with a wa
 velength of 13.5 nanometers for semiconductor manufacturing: In a vacuum c
 hamber\, a droplet generator shoots 50\,000 tin droplets per second.\nSpea
 ker: James Doogan
LAST-MODIFIED:20250916T085435Z
LOCATION:Building K\, Haber-Villa\, Faradayweg 8\, 14195 Berlin\, Room: Sem
 inar Room
ORGANIZER;CN=Department of Molecular Physics:mailto:thomas@fhi.mpg.de
SUMMARY:CO<sub>2</sub> High Power Lasers for EUV Lithography 
URL;VALUE=URI:https://www.fhi.mpg.de/events/42870/60031
END:VEVENT
END:VCALENDAR